We offer a complete line of
film thickness measurement systems that can measure from
nm to 200 µm
for analysis of single layer and/or multilayer films in less than a
second. StellarNet thin film
reflectometry systems consist of a portable
USB spectrometer coupled to a reflectance
probe and light source.
The optical properties are obtained from
reflection and thickness is measured by detecting the sinusoidal fringe pattern from
the sample's specular reflectance.
Several spectrometer models are available to suit your thin film and/or optical measurement requirements.
application requirements to
Dual Spectrometer Thin Film Measurement system for wavelength range
200-1700nm and layer thickness values of 50A-200um
Thin Film System
Real-time Spectral Capture and Instrument control
Includes Large Library of Materials Data
Supports multilayer, freestanding, rough, and both
thick and thin
New materials easily added
Supports Parameterized materials: Cauchy, Sellmeir,
oscillator, Tauc-Lorentz oscillator, Drude-Lorentz
optical constants (n and k) can be measured quickly and easily using
powerful user-friendly software which make daily complex measurements
quick and simple.
TF software includes a
large library of materials data that enables
measurement of the wide range of layer structures: multilayer,
freestanding, rough, thick and thin layer structures are supported.
New materials can be added easily by measuring corresponding sample
or importing data from the text file.
The measurement process
consists of two steps: data acquisition and data analysis.
TF Systems defines all the process in a measurement recipe and
makes it transparent to the user. At the same time the user has the
ability to store measured data and analyze it later.
Parameterized materials e.g. Cauchy, Sellmeir, EMA (effective-medium
approximation), Harmonic oscillator, Tauc-Lorentz oscillator,
Drude-Lorentz and many more approximations. These approximations
represent optical dispersion of materials in desired spectral range
using few coefficients that can be adjusted. For example, oxides are
frequently represented using Cauchy and glasses using Sellmeir
approximation, amorphous materials (e.g. SiNx, aSi) can be
represented using Tauc-Lorentz and phase-mixed materials (e.g. poly-Si)
using EMA approximation.
Measurements are made
using: reflectance/transmittance spectroscopy which measures the
optical response of the layer structure. The user creates an optical
model of the layer structure and uses data analysis to determine
physical properties: the results are inferred from the best fit of
measured and modeled data. TF software provides many options to
easily analyze simple and most complex filmstacks, graded layers,
periodic structures, very thick films, films on thin substrates,
multi-sample measurements, etc. Simulation and error-estimator
tools allow user better understand data and the expected precision.
During in-situ, in-line
or other long running measurements conditions like surface
roughness, ambient light, etc. may be changing. TF
roughness and scaling correction that allows factoring in these
From most simple, routine measurements to multilayer, multi-sample
analysis - our software is ready to help!
Transmittance of a free standing polymer.
Estimated thickness is ~
MODBUS TCP Server Add-on
The Modbus server plug-in
provides a communication
interface over TCP IP.
deployed as a
server and supports
integration. This allows
user to send a
request from any
program and receive back
the thickness results
Reflectance Probe has both illumination and read
bundled together coupling to the system. The new, improved reflectance probe holder allows for variable distance from
Film standards for thickness measurement verification. Includes Si
substrate for reference with 2 additional SiO2
100nm and 1000nm thickness.
*System prices below include probe, stand and light source.
TF-STD1 standards are additional cost. Contact
ThinFilm_Experts@StellarNet.us for a quote!
Portable spectrometers include
a USB-2 interface cable and interface to
any 32-bit pc for a portable or tabletop measurement system.
Vacuum deposition is a family of processes used to deposit
layers atom-by-atom or molecule-by-molecule at sub-atmospheric
pressure on a solid surface. The layers may be as thin as one atom
to millimeters thick (freestanding structures). There may be
multiple layers of different materials (e.g. optical coatings). A
thickness of less than one micrometer is
generally called a thin film while a thickness greater than one
micrometer is called a coating.
StellarNet Thin-Film measurement systems can be
used to check deposition thickness of a wide range of materials.
to discuss your application.
production of Thin-Film Photovoltaics (TFPVs)
is becoming more predominant due to lower costs than their
silicon-wafer-based cousins. Getting the accurate thickness
measurement is extremely crucial to efficiency and reliability as
well as maintaining production costs. Films include
active layers such
as thin silicon, II-VI materials such as
CdTe, and CIGS (copper indium gallium
selenide). Additionally, TCO
(transparent conductive oxide) stacks, polyimides and resists used
to define cells and electrodes, as well as anti-reflection coatings
can all be measured with StellarNet Thin Film Measurement systems.
CdS/CIGS stack results
Fit measured vs. generated data